Features of microwave photoconductance of quantum point contact and silicon field effect transistor
- Autores: Jaroshevich A.S.1, Tkachenko V.A.1,2, Kvon Z.D.1,2, Kuzmin N.S.2, Tkachenko O.A.1, Baksheev D.G.2, Marchishin I.V.1, Bakarov A.K.1, Rodyakina E.E.1,2, Antonov V.A.1, Popov V.P.1, Latyshev A.V.1,2
- 
							Afiliações: 
							- Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
- Novosibirsk State University
 
- Edição: Volume 88, Nº 9 (2024)
- Páginas: 1495–1502
- Seção: Quantum Optics and Quantum Technologies
- URL: https://rjpbr.com/0367-6765/article/view/681839
- DOI: https://doi.org/10.31857/S0367676524090249
- EDN: https://elibrary.ru/OCDTLA
- ID: 681839
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		                                					Resumo
Quantum point contacts with a short (100 nm) channel in a high mobility two-dimensional electron gas of GaAs/Al(Ga)As heterostructures and a short-channel p-type field-effect transistor in a silicon-on-insulator structure were fabricated and studied experimentally and by modeling at the Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences in order to study the response of samples to weak irradiation by an electromagnetic field with a frequency of ~2 GHz. This response in the tunnel mode at a temperature of 4.2 K turned out to be gigantic and was observed against the background of features caused by impurity disorder.
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	                        Sobre autores
A. Jaroshevich
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
							Autor responsável pela correspondência
							Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
V. Tkachenko
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk; Novosibirsk						
Z. Kvon
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk; Novosibirsk						
N. Kuzmin
Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
O. Tkachenko
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
D. Baksheev
Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
I. Marchishin
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
A. Bakarov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
E. Rodyakina
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk; Novosibirsk						
V. Antonov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
V. Popov
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk						
A. Latyshev
Rzhanov Institute of Semiconductor Physics of the Siberian Branch of the Russian Academy of Sciences; Novosibirsk State University
														Email: jarosh@isp.nsc.ru
				                					                																			                												                	Rússia, 							Novosibirsk; Novosibirsk						
Bibliografia
- Van Wees B.J., Van Houten H., Beenakker C.W.J. et al. // Phys. Rev. Lett. 1988. V. 60. No. 9. P. 848.
- Wharam D., Thornton T.J., Newbury R. et al. // J. Physics C. 1988. V. 2. No. 8. Art. No. L209.
- Büttiker M. // Phys. Rev. B. 1990.V. 41. No. 11. P. 7906.
- Thomas K.J., Nicholls J.T., Appleyard N.J. et al. // Phys. Rev. B. 1998. V. 58. No. 8. P. 4846.
- Kristensen A., Bruus H., Hansen A.E. et al. // Phys. Rev. B. 2000. V. 62. No. 16. P. 10950.
- Tkachenko O.A., Tkachenko V.A., Baksheyev D.G. et al. // J. Appl. Phys. 2001. V. 89. No. 9. P. 4993.
- Renard V.T., Tkachenko O.A., Tkachenko V.A. et al. // Phys. Rev. Lett. 2008. V. 100. No. 18. Art. No. 186801.
- Ткаченко О.А., Ткаченко В.А. // Письма в ЖЭТФ. 2012. Т. 96. № 11. С. 804; Tkachenko O.A., Tkachenko V.A. // JETP Lett. 2013. V. 96. No. 11. P. 719.
- Smith L.W., Al-Taie H., Lesage A.A.J. et al. // Phys. Rev. Appl. 2016. V. 5. Art. No. 044015.
- Pokhabov D.A., Pogosov A.G., Zhdanov E.Yu. et al. // Appl. Phys. Lett. 2018. V.112. No. 8. Art. No. 082102.
- Srinivasan A., Farrer I., Ritchie D.A. et al. // Appl. Phys. Lett. 2020. V. 117. No. 18. Art. No. 183101.
- Hofstein S.R., Heiman F.P. // Proc. IEEE. 1963. V. 51. No. 9. P. 1190.
- Sze S.M. Physics of semiconductor devices. New York: John Willey, 1981. 868 p.
- Французов А.А., Бояркина Н.И., Попов В.П. // ФТП. 2008. Т. 42. № 2. С. 212; Frantsuzov A.A., Boyarkina N.I., Popov V.P. // Semiconductors. 2008. V. 42. No. 2. P. 215.
- Ando T., Fowler A.B. Stern F. // Rev. Mod. Phys. 1982. V. 54. No. 2. P. 437.
- Arnold E. // Appl. Phys. Lett. 1974. V. 25. No.12. P. 705.
- Kwasnick R.F., Kastner M.A., Meingailis J. et al. // Phys. Rev. Lett. 1984. V. 52. No. 15. P. 224.
- Fowler A.B., Wainer J.J., Webb R.A. // IBM J. Res. Dev. 1988. V. 32. No. 3. P. 372.
- Popović D., Fowler A.B., Washburn S. et al. // Phys. Rev. Lett. 1991. V. 67. No. 20. P. 2870.
- de Graaf C., Wildöer J.W.G., Caro J. et al. // Surf. Science. 1992. V. 263. No. 1–3. P. 409.
- Specht M., Sanquer M., Caillat C. et al. // In: IEEE International Electron Devices Meeting 1999. Technical Digest (Cat. No. 99CH36318). 1999. P. 383.
- Wacquez R., Vinet M., Pierre M., Roche B. et al. // IEEE Symp. VLSI Technol. 2010. P. 193.
- Paz B.C., Le Guevel L., Cassé M. et al. // IEEE 33rd Int. Conf. Microelectron. Test Struct. 2020. P. 1.
- Ландау Л.Д., Лифшиц Е.М. Квантовая механика. Нерелятивистская теория. М.: Наука, 1974. 752 с.
- Altshuler B.L., Lee P.A., Webb R.A. Mesoscopic phenomena in solids. Amsterdam, 1991.
- Landauer R. // In: Localization interactions and transport phenomena. Heidelberg: Springer, 1985. P. 38.
- Fisher D.S., Lee P.A. // Phys. Rev. B. 1981. V. 23. P. 6851.
- Datta S. Electronic transport in mesoscopic systems. Cambridge: Cambridge University Press, 1995. 377 p.
- Imry Y. Introduction to mesoscopic physics. NY.: Oxford University Press, 1997.
- Sohn L., Kouwenhoven L.P., Schön G. Mesoscopic electron transport. Dordrecht: Kluwer, 1997.
- Tkachenko O.A., Tkachenko V.A., Kvon Z.D. et al. // In: Advances in semiconductor nanostructures. Growth, characterization, properties and applications. Ch. 6. Elsevier, 2017. P. 131.
- Regul J., Hohls F., Reuter D. // Physica E. 2004. V. 22. No. 1–3. P. 272.
- Ferrari G., Prati E., Fumagalli et al. // Proc. EuMC. 2005. V. 2. P. 4.
- Prati E., Fanciulli M., Calderoni A. et al. // Phys. Lett. A. 2007. V. 370. No. 5–6. P. 491.
- Naser B., Ferry D.K., Heeren J. et al. // Physica E. 2007. V. 40. No. 1. P. 84.
- Hohls F., Fricke C., Haug R.J. // Physica E. 2008. V. 40. No. 5. P. 1760.
- Wang Z., Chen D., Ota T., Fujisawa T. // Japan. J. Appl. Phys. 2009. V. 48. No. 4C. Art. No. 04C148.
- Kamata H., Ota T., Fujisawa T. // Japan. J. Appl. Phys. 2009. V. 48. No. 4C. Art. No. 04C149.
- Wang P., He J. // Physica E. 2019. V. 108. P. 160.
- Jarratt M.C., Waddy S.J., Jouan A. et al. // Phys. Rev. Appl. 2020. V. 14. No. 6. Art. No. 064021.
- Ткаченко В.А., Ярошевич А.С., Квон З.Д. и др. // Письма в ЖЭТФ. 2021. Т. 114. № 2. С. 108; Tkachenko V.A., Yaroshevich A.S., Kvon Z.D. et al. // JETP Lett. 2021. V. 114. P. 110.
- Кузьмин Н.С., Ярошевич А.С., Квон З.Д. и др. // ФТТ. 2023. Т. 65. № 10. С. 1842; Kuzmin N.S., Jaroshevich A.S., Kvon Z.D. et al. // Phys. Solid State. 2023. V. 65. No. 10. P. 1765.
- Jaroshevich A.S., Kvon Z.D., Tkachenko V.A. et al. // Appl. Phys. Lett. 2024. V. 124. No. 6. Art. No. 063501.
- Growth C. W., Wimmer M., Akhmerov A. R. et al. // New J. Phys. 2014. V. 16. No. 6. Art. No. 063065.
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